Intel Foundry, ASML deepen High NA EUV collaboration to speed production readiness
Reuters2026/09/08 06:09- Intel partnered with ASML to accelerate production readiness for High NA EUV lithography.
- More than 1,000,000 wafers have been processed using High NA across tool certification, R&D, and select high-volume layers for Panther Lake.
- Intel 18A chips using High NA on select layers met or exceeded performance versus comparable layers patterned on ASML’s 0.33 NA NXE EUV tools.
- The companies are aligning the ecosystem for a shift from 6-inch masks to 6x12-inch masks, with stitching to support current masks.
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